
CrN thin film, produced by our HCD (hollow cathode deposition) process, is availible up to 15 microns thick for your tool coating applications. CrN is produced by our NTH-1000 using the same ion plating process as TiN.
An AFM scan of CrN Thin-film
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CrN is produced by the electron bombardment of a chromium source by hollow
cathode discharge. The resulting evaporant reacts with nitrogen gas which
is continually feed into the chamber. The resulting thin film can be CrN,
Cr2N, or a mixture of both, depending on the mass flow rate of nitrogen
used during the deposition.
Compared with TiN thin film, CrN offers a lower coefficient of friction
as well as greater resistance to lock-up during movement. As such, CrN
thin film is more suitable for tribological applications. CrN also offers
greater thermal resistance and acid-base corrosion resistance than does
TiN thin film.
Friction test with tribometer
