DASH-700: Multi-Processing Capability
The Multi-700 is the latest addition to our product line. It uses several PVD and other deposition techniques to deposit multi-layer thin-films. Current deposition techniques include: dc hot filament plasma PVD, ion-mixing(implantation), DC and RF magnetron sputter, and both cathodic arc and hollow cathode discharge ion plating. There are 5 flange ports which allow up to five process sources to be added to the chamber at one time.
Current applications include:
- Ion Mixing DLC
- Sputtered WC-DLC
- Sputtered Si-DLC